Electrical stress effects on ultrathin (2.3 nm) oxides

Journal of Non-Crystalline Solids

Volumn 280, Issue 1-3, 2001, Pages 86-91

  Zander, D ^a   Saigne, F ^a   Petit, C ^a   Meinertzhagen, A ^a  

^a UNIVERSITÉ DE REIMS CHAMPAGNE ARDENNE   (France)

Author keywords

[No Author keywords available]

Indexed keywords

DIELECTRIC FILMS; ELECTRIC FIELD EFFECTS; INTERFACES (MATERIALS); LEAKAGE CURRENTS; THERMAL EFFECTS; ULTRATHIN FILMS;

ULTRATHIN OXIDES;

OXIDES;

EID: 0034817765     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-3093(00)00393-8     Document Type: Article

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