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Volumn 17, Issue 11, 2001, Pages 835-839
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Investigation of submicron linewidth direct deposition for high-density IC chip modification by focused ion beam
a
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Author keywords
Deposition; FIB; Modification; Submicron
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Indexed keywords
COMPUTER SOFTWARE;
DEPOSITION;
IMAGE PROCESSING;
IMAGE QUALITY;
IMAGING SYSTEMS;
ION BEAMS;
MICROPROCESSOR CHIPS;
SCANNING;
SCANNING ELECTRON MICROSCOPY;
X RAY SPECTROMETERS;
FOCUSED ION BEAM;
HIGH-DENSITY INTEGRATED CIRCUIT CHIP;
SUBMICRON LINEWIDTH DIRECT DEPOSITION;
INTEGRATED CIRCUIT MANUFACTURE;
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EID: 0034812172
PISSN: 02683768
EISSN: None
Source Type: Journal
DOI: 10.1007/s001700170111 Document Type: Article |
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Times cited : (4)
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References (1)
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