Influence of preparation process on laser induced damage threshold of HfO2 films

Qiangjiguang Yu Lizishu/High Power Laser and Particle Beams

Volumn 13, Issue 1, 2001, Pages 31-33

  Ma, P ^a   Chai, L ^a   Qiu, F M ^a   Gu, Y Y ^a  

^a CHENGDU FINE OPTICAL ENGINEERING RESEARCH CENTER   (China)

Author keywords

Hafnia films; Laser induced damage; Surface roughness

Indexed keywords

COATINGS; DEFECTS; EVAPORATION; FILM PREPARATION; LASER DAMAGE; MICROSTRUCTURE; SUBSTRATES; SURFACE ROUGHNESS; THIN FILMS;

HAFNIA FILMS; LASER INDUCED DAMAGE; REACTIVE EVAPORATIONS; THRESHOLD;

HIGH POWER LASERS;

EID: 0034803531     PISSN: 10014322     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (6)

1. A historical perspective on fifteen years of laser damage thresholds at LLNL
2. Ion assisted deposition of optical coatings
3. Characterization of HR coatings for the megajoule laser transport mirrors
4. Comparison between 355 nm and 1064 nm damage of high grade dielectric mirror coatings
5. Role of cracks, pores, and absorbing inclusions on laser induced damage threshold at surfaces of transparent dielectrics