Principle and process window of cerium dioxide thin film fabrication with dual plasma deposition

Journal of Materials Science and Technology

Volumn 17, Issue 1, 2001, Pages 29-30

  Wang, L P ^a   Tang, B Y ^a   Tian, X B ^a   Leng, Y X ^a   Zhang, Q Y ^a   Chu, P K ^a  

^a CITY UNIVERSITY OF HONG KONG   (Hong Kong)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0034784139     PISSN: 10050302     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (12)