Microstructure control of silica thin film by spin coating method

Key Engineering Materials

Volumn 206-213, Issue III, 2001, Pages 2185-2188

  Ohno, T ^a   Suzuki, H ^a   Takahashi, J ^a   Shimada, S ^a   Ota, T ^a   Takahashi, M ^a   Hikichi, Y ^a  

^a SHIZUOKA UNIVERSITY   (Japan)

Author keywords

Deposition mechanism; Microstructure control; Silica monodisperse particles; Thin film

Indexed keywords

COMPUTER SIMULATION; DEPOSITION; MICROSTRUCTURE; SHEAR STRESS; SPIN COATING; THIN FILMS;

MONODISPERSE PARTICLES;

SILICA;

EID: 0034782933     PISSN: 10139826     EISSN: 16629795     Source Type: Book Series    
DOI: None     Document Type: Conference Paper

References (6)