Swing curve phase and amplitude effects in optical lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4344, Issue 1, 2001, Pages 616-622

  Martin, Brian ^a   Tighe, Tom ^a   Arthur, Graham ^b  

^a Mitel Semiconductor   (United Kingdom)

^b RUTHERFORD APPLETON LABORATORY   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

FOCUSING; INTERFACES (MATERIALS); SCANNING ELECTRON MICROSCOPY; SUBSTRATES;

STEPPER FOCUS; SWING CURVE PHASE;

PHOTORESISTS;

EID: 0034768881     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.436785     Document Type: Article

References (1)