Photolithographic evaluation of various photoresist materials for maskmaking applications

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4345, Issue 1, 2001, Pages 511-520

  Singh, Birender ^a   Montgomery, Warren ^a  

^a APPLIED MATERIALS INC   (United States)

Author keywords

i line resist; Iso dense bias; Maskmaking; Photolithography

Indexed keywords

DRY ETCHING; INTEGRATED CIRCUIT MANUFACTURE; MASKS; OPTICAL RESOLVING POWER; PLASMA ETCHING;

MASKMAKING;

PHOTORESISTS;

EID: 0034757365     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.436883     Document Type: Article

References (1)