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Volumn 135, Issue 2-3, 2001, Pages 208-220

Study of plasma parameters in a BAI 730 M triode ion plating system by means of a Langmuir probe and plasma mass and energy spectroscopy

Author keywords

[No Author keywords available]

Indexed keywords

CHROMIUM COMPOUNDS; CURRENT VOLTAGE CHARACTERISTICS; ELECTRIC CURRENT MEASUREMENT; PLASMA DENSITY; SPECTROSCOPIC ANALYSIS; TITANIUM NITRIDE; TRIODES; VAPOR DEPOSITION; VOLTAGE MEASUREMENT;

EID: 0034745892     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(00)00998-1     Document Type: Article
Times cited : (10)

References (10)
  • 6
    • 0005980988 scopus 로고
    • Langmuir probe diagnostics
    • D.A. Glocker, S. Ismath Shah (Eds.), Institute of Physics Publishing, Bristol
    • N. Herskowitz, Langmuir probe diagnostics, in: D.A. Glocker, S. Ismath Shah (Eds.), Handbook of Thin Film Process Technology, Institute of Physics Publishing, Bristol, 1995, p. D3.0:1.
    • (1995) Handbook of Thin Film Process Technology
    • Herskowitz, N.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.