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Volumn 40, Issue 6, 2001, Pages 525-530

CVD of boron and dichloroborane formation in a hot-wire fiber growth reactor

Author keywords

Boron fibers; CVD; Dichloroborane; Reaction kinetics

Indexed keywords

BORON; CHEMICAL VAPOR DEPOSITION; DIFFUSION; EFFLUENTS; INFRARED SPECTROPHOTOMETERS; REDUCTION; SUBSTRATES;

EID: 0034740740     PISSN: 02552701     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0255-2701(00)00150-1     Document Type: Article
Times cited : (13)

References (18)
  • 9
    • 0020734622 scopus 로고
    • Theoretical influence of the chemical vapor deposition processes on the thickness and structural uniformity of deposits
    • (1983) Thin Solid Films , vol.102 , pp. 149-159
    • Vandenbulcke, L.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.