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Volumn 162, Issue 1-2, 2000, Pages 83-95
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Chemical vapour deposition - A new approach to reactive surface defects of uniform geometry on high surface area magnesium oxide
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Author keywords
Chemical vapour deposition; EPR; FTIR; MgO; Surface defects; Surface reactivity
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Indexed keywords
ANION;
CATION;
MAGNESIUM OXIDE;
ARTICLE;
CHEMICAL ANALYSIS;
CHEMICAL REACTION;
ELECTRON SPIN RESONANCE;
GEOMETRY;
HYDROXYLATION;
INFRARED SPECTROSCOPY;
MAGNETISM;
NANOPARTICLE;
PHOTOCHEMISTRY;
REACTION ANALYSIS;
SURFACE PROPERTY;
SYNTHESIS;
TEMPERATURE SENSITIVITY;
VAPOR;
VIBRATION;
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EID: 0034693480
PISSN: 13811169
EISSN: None
Source Type: Journal
DOI: 10.1016/S1381-1169(00)00323-X Document Type: Article |
Times cited : (63)
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References (41)
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