SCOPUS 정보 검색 플랫폼

Journal of the American Chemical Society

Volumn 122, Issue 41, 2000, Pages 10063-10072

Neutral alkoxysilanes from silica

(6) Cheng, H a Tamaki, R a,b Laine, R M a Babonneau, F c Chujo, Y b Treadwell, D R a

a UNIVERSITY OF MICHIGAN (United States)

b KYOTO UNIVERSITY (Japan)

c UNIVERSITÉ PIERRE ET MARIE CURIE (France)

Author keywords

[No Author keywords available]

Indexed keywords

SILANE DERIVATIVE; SILICON DIOXIDE;

ARTICLE; CARBON NUCLEAR MAGNETIC RESONANCE; CHEMICAL ANALYSIS; CHEMICAL REACTION; CHEMICAL STRUCTURE; MASS SPECTROMETRY; NUCLEAR MAGNETIC RESONANCE SPECTROSCOPY; PROTON NUCLEAR MAGNETIC RESONANCE; SYNTHESIS; THERMOGRAVIMETRY;

EID: 0034684226 PISSN: 00027863 EISSN: None Source Type: Journal
DOI: 10.1021/ja001885h Document Type: Article

Times cited : (66)

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