Contamination-free decomposition of zirconium oxide for the determination of ultra-trace silicon by inductively coupled plasma-atomic emission spectrometry

Analytica Chimica Acta

Volumn 416, Issue 1, 2000, Pages 117-119

  Watanabe, Mitsuyoshi ^a   Horiki, Ayako ^a   Uchida, Tetsuo ^b  

^a Materials Research Laboratory   (Japan)

^b NAGOYA INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

Inductively coupled plasma atomic emission spectrometry; Pt lined PTFE vessel; Trace Si; Zirconium oxide

Indexed keywords

POLITEF; SILICON; SULFURIC ACID; ZIRCONIUM OXIDE;

ARTICLE; ASSAY; ATOMIC EMISSION SPECTROMETRY; CHEMICAL ANALYSIS; CONTROLLED STUDY; DECOMPOSITION; MEASUREMENT; NONHUMAN; PRIORITY JOURNAL;

EID: 0034601117     PISSN: 00032670     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0003-2670(00)00885-0     Document Type: Article

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