Silicon microfabrication technologies for nano-satellite applications

Space 2000

Volumn , Issue , 2000, Pages 482-487

  Shul, R J ^a   Kravitz, S H ^a   Christenson, T R ^a   Willison, C G ^a   Zipperian, T E ^a  

^a SANDIA NATIONAL LABORATORIES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

OPTICAL MATERIALS; RADIATION SHIELDING; SEMICONDUCTOR MATERIALS; SILICON; SUBSTRATES;

THERMAL MANAGEMENT SYSTEM;

SATELLITES;

EID: 0034586987     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1061/40479(204)60     Document Type: Conference Paper

References (1)

1. Patent No. 5501893: Method of Anisotropically Etching Silicon. Inventors: Franz Laermer, and Andrea Schilp of Robert Bosch GmbH. Issued March 26, 1996.