Numerical investigation of the resolution in solid immersion lens systems

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4099, Issue 1, 2000, Pages 235-245

  Bischoff, J ^a   Brunner, R ^a  

^a CARL ZEISS SMT AG   (Germany)

Author keywords

Evanescent fields; Lithography; Optical data storage; Optical modeling; RCWA; Solid immersion microscopy; Superresolution

Indexed keywords

ELECTROMAGNETIC FIELDS; IMAGING TECHNIQUES; LITHOGRAPHY; MULTILAYERS; OPTICAL IMAGE STORAGE; OPTICAL RESOLVING POWER; POLARIZATION; REFRACTIVE INDEX;

SOLID IMMERSION LENS SYSTEM;

OPTICAL INSTRUMENT LENSES;

EID: 0034546855     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.405824     Document Type: Article

References (0)