Measuring thicknesses of native oxide, crystalline-silicon, buried oxide layers, and the interface roughnesses of SOI

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4181, Issue , 2000, Pages 238-245

  Bloomer, Iris ^a   Li, G G ^a   Forouhi, A R ^a   Auberton Herve, A ^a   Wittkower, A ^a  

^a n&k Technology   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

INTERFACES (MATERIALS); OPTICAL PROPERTIES; OXIDES; SILICON WAFERS; SURFACE ROUGHNESS; THIN FILMS;

BURIED OXIDE LAYERS;

SILICON ON INSULATOR TECHNOLOGY;

EID: 0034546731     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.395734     Document Type: Conference Paper

References (5)