Precise mask alignment design to crystal orientation of (100) silicon wafer using wet anisotropic etching

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4174, Issue 1, 2000, Pages 462-466

  Chen, Ping Hei ^a   Hsieh, Chia Ming ^a   Peng, Hsin Yah ^a   Chyu, Minking K ^b  

^a NATIONAL TAIWAN UNIVERSITY   (Taiwan)

^b University of Pittsburgh   (United States)

Author keywords

Anisotropic etching; Mask alignment; Micromachining; Undercu

Indexed keywords

ANISOTROPY; CRYSTAL ORIENTATION; ETCHING; MASKS; MICROELECTROMECHANICAL DEVICES; MICROMACHINING;

MASK ALIGNMENT; WET ANISOTROPIC ETCHING;

SILICON WAFERS;

EID: 0034545750     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.396466     Document Type: Article

References (0)