MEEF measurement and model verification for 0.3 k1 lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4181, Issue , 2000, Pages 33-40

  Parker, Colin R ^a   Reilly, Michael T ^a  

^a SHIPLEY COMPANY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

INTEGRATED CIRCUIT MANUFACTURE; MASKS; MATHEMATICAL MODELS; OPTIMIZATION; PHASE SHIFT;

MASK ERROR ENHANCEMENT FACTOR (MEEF);

PHOTORESISTS;

EID: 0034545743     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.395749     Document Type: Conference Paper

References (4)