Characteristics of tantalum oxynitride films prepared by RF magnetron sputtering

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4099, Issue , 2000, Pages 246-254

  Jong, C A ^a   Chin, T S ^a  

^a NATIONAL TSING HUA UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

DIELECTRIC MATERIALS; FILM PREPARATION; MAGNETRON SPUTTERING; MICROSTRUCTURE; REFRACTIVE INDEX; RESIDUAL STRESSES; SURFACE ROUGHNESS; TANTALUM COMPOUNDS; THERMAL EXPANSION; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

SCANNING PROBE MICROSCOPY; TANTALUM OXYNITRIDE THIN FILMS;

METALLIC FILMS;

EID: 0034545737     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.405826     Document Type: Conference Paper

References (7)