Large area MEMS fabrication with thick SU-8 photoresist applied to an X-ray image sensor array

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4174, Issue 1, 2000, Pages 40-48

  Daniel, Jurgen H ^a   Krusor, Brent ^c   Apte, Raj B ^c   Street, Robert A ^c   Goredema, Adela ^c   McCallum, Jason ^c   Boils Boissier, Daniele C ^c   Kazmaier, Peter M ^c  

^a PALO ALTO RESEARCH CENTER   (United States)

^b Xerox Research Center Canada   (United States)

^c NONE

Author keywords

Electroplating; HARMS; Interlayer dielectric; Large area MEMS; Micromachining; SU 8; X ray image

Indexed keywords

DIELECTRIC MATERIALS; ELECTROPLATING; GLASS; IMAGE ANALYSIS; IMAGE QUALITY; IMAGE SENSORS; MICROMACHINING; PHOTORESISTS; SUBSTRATES; THIN FILMS;

INTERLAYER DIELECTRICS; MICROFABRICATION METHODS; X-RAY IMAGE SENSOR ARRAYS;

MICROELECTROMECHANICAL DEVICES;

EID: 0034545713     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.396431     Document Type: Article

References (0)