Raman spectroscopy - a multi-functional analysis tool for microelectronics manufacturing

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4182, Issue 1, 2000, Pages 221-230

  Ballast, Lynette K ^a   Hossain, Tim Z ^a   Campion, Alan ^b  

^a ADVANCED MICRO DEVICES   (United States)

^b UNIVERSITY OF TEXAS AT AUSTIN   (United States)

Author keywords

Cobalt silicide; Contamination identification; Defect analysis; Nondestructive chemical analysis; Phase transformations; Polysilicon; Raman spectroscopy; Thin films

Indexed keywords

CHEMICAL ANALYSIS; DEFECTS; NONDESTRUCTIVE EXAMINATION; PHASE TRANSITIONS; RAMAN SPECTROSCOPY; THIN FILMS;

COBALT SILICIDE; CONTAMINATION IDENTIFICATION; POLYSILICON;

MICROELECTRONIC PROCESSING;

EID: 0034545391     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.410082     Document Type: Article

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