Investigations into the flow characteristics of hexagonal ducts etched in 〈100〉 silicon

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4177, Issue , 2000, Pages 142-153

  Damean, N ^a   Regtien, P P L ^a  

^a UNIVERSITY OF TWENTE   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

ASPECT RATIO; COMPUTER SOFTWARE; ETCHING; HYDRODYNAMICS; SILICON;

HEXAGONAL DUCTS; POISEUILLE NUMBER;

DUCTS;

EID: 0034544854     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (33)