Release etch modeling analysis and the use of Laser Scanning Microscopy for etch time prediction of micromachined structures

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4174, Issue 1, 2000, Pages 267-278

  Matamis, George ^a   Gogoi, Bishnu ^a   Monk, David ^a   McNeil, Andrew ^a   Burrows, Veronica ^b  

^a MOTOROLA INC   (United States)

^b Arizona State University   (United States)

Author keywords

Microelectromechanical systems (MEMS); Phosphosilicate glass (PSG); Sacrificial layer

Indexed keywords

ETCHING; GLASS; LASER APPLICATIONS; MICROELECTROMECHANICAL DEVICES; MICROSENSORS; NONDESTRUCTIVE EXAMINATION; OPTICAL MICROSCOPY; PRESSURE MEASUREMENT;

LASER SCANNING MICROSCOPY (LSM); NONLINEAR ETCHING;

MICROMACHINING;

EID: 0034544792     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.396442     Document Type: Article

References (0)