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Volumn , Issue , 2000, Pages 213-214
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Semiconductor microlenses fabricated by one-step wet etching
a a a |
Author keywords
[No Author keywords available]
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Indexed keywords
ATOMIC FORCE MICROSCOPY;
CURVE FITTING;
ETCHING;
PHOTOLITHOGRAPHY;
PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;
REACTIVE ION ETCHING;
SCANNING ELECTRON MICROSCOPY;
SEMICONDUCTING GALLIUM ARSENIDE;
SEMICONDUCTING INDIUM PHOSPHIDE;
SEMICONDUCTOR DEVICE MANUFACTURE;
SEMICONDUCTOR DEVICES;
SILICON NITRIDE;
DIFFUSION LIMITED ETCHING;
ONE STEP WET ETCHING;
SEMICONDUCTOR MICROLENSES;
LENSES;
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EID: 0034542901
PISSN: None
EISSN: None
Source Type: Conference Proceeding
DOI: None Document Type: Article |
Times cited : (3)
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References (3)
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