Development of TMAH anisotropic etching manufacturing process for MEMS

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4174, Issue 1, 2000, Pages 142-153

  Tsaur, Jiunnjye ^a   Yang, S I ^a   Du, Chen Hsun ^a   Lin, Zongshen ^a   Huang, Chengtang ^a   Lee, Chengkuo ^a  

^a Science Based Industrial Park   (Taiwan)

Author keywords

Anisotropic etching; front side micromachinmg; Silicon; Taguchi method; TMAH

Indexed keywords

ADDITION REACTIONS; ANISOTROPY; ETCHING; MASKS; SEMICONDUCTING SILICON; STATISTICAL METHODS; SUBSTRATES;

TAGUCHI METHODS; WAGON-WHEEL MASK PATTERNS;

MICROMACHINING;

EID: 0034542584     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.396424     Document Type: Article

References (0)