In situ ellipsometric measurements of thin-film aluminum oxidation

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4099, Issue 1, 2000, Pages 218-227

  Lindmark, Eric K ^a   Nowak, Janusz J ^a   Kief, Mark T ^a  

^a SEAGATE TECHNOLOGY   (United States)

Author keywords

In situ ellipsometry; Metrology; Oxidation; Spectroscopic ellipsometry; UV oxidation

Indexed keywords

ALUMINA; ELLIPSOMETRY; FILM GROWTH; MONOLAYERS; OPTICAL MULTILAYERS; OXIDATION; SILICON WAFERS; THERMOOXIDATION;

SPECTROSCOPIC ELLIPSOMETRY; THIN FILM ALUMINUM OXIDATION;

ULTRATHIN FILMS;

EID: 0034542516     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.405822     Document Type: Article

References (0)