Bulk micromachining of SOI wafers using double sided lithography and anisotropic wet etching

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4174, Issue , 2000, Pages 485-495

  Rodjegard, Henrik ^a   Andersson, Gert I ^a  

^a CHALMERS UNIVERSITY OF TECHNOLOGY   (Sweden)

Author keywords

[No Author keywords available]

Indexed keywords

ACCELEROMETERS; ELECTRODEPOSITION; ETCHING; LITHOGRAPHY; MICROMACHINING; PHOTORESISTS;

ANISOTROPIC WET ETCHING; BULK MICROMACHINING; DOUBLE SIDED LITHOGRAPHY;

SILICON ON INSULATOR TECHNOLOGY;

EID: 0034542358     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.396469     Document Type: Conference Paper

References (16)