Microtensile tests with the aid of probe microscopy for the study of MEMS materials

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4175, Issue , 2000, Pages 96-103

  Chasiotis, Ioannis ^a   Knauss, Wolfgang G ^a  

^a CALIFORNIA INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; CORRELATION METHODS; ELASTIC MODULI; ELECTROSTATICS; IMAGE PROCESSING; MICROELECTROMECHANICAL DEVICES; MICROMACHINING; POISSON RATIO; SEMICONDUCTING SILICON; SURFACE ROUGHNESS; TENSILE STRENGTH; TENSILE TESTING;

DIGITAL IMAGE CORRELATION METHOD;

SEMICONDUCTING FILMS;

EID: 0034542354     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.395616     Document Type: Conference Paper

References (23)