High-Q silicon-based microring resonators fabricated using 248 nm optical lithography

Pacific Rim Conference on Lasers and Electro-Optics, CLEO - Technical Digest

Volumn , Issue , 2000, Pages 691-692

  Maki, P A ^a   Fritze, M ^a   Lim, D R ^a   Little, B E ^a   Palmateer, S C ^a   Kimerling, L C ^a   Haus, H A ^a  

^a MASSACHUSETTS INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICON; ANNEALING; ANTIREFLECTION COATINGS; LIGHT ABSORPTION; LIGHT SCATTERING; LIGHT TRANSMISSION; MATHEMATICAL MODELS; OPTICAL WAVEGUIDES; PHOTOLITHOGRAPHY; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; POLYCRYSTALLINE MATERIALS; SILICON WAFERS;

MICRORING RESONATORS; OPTICAL CONFINEMENT; POLYCRYSTALLINE SILICON;

OPTICAL RESONATORS;

EID: 0034542203     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Article

References (5)