Localized Electrochemical Deposition - the growth behavior of nickel micro-columns

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4174, Issue 1, 2000, Pages 30-39

  Yeo, S H ^a   Choo, J H ^a   Yip, K S ^a  

^a NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

Author keywords

Direct 3 D Microfabrication; Electrochemical Deposition; High Aspect Ratio; Maskiess Process; MEMS; Microengineering; Micromechanical Structures; Rapid Prototyping

Indexed keywords

ASPECT RATIO; CLOSED LOOP CONTROL SYSTEMS; DEPOSITION; ELECTROCHEMICAL ELECTRODES; FEEDBACK CONTROL; MICROELECTRODES; MICROMACHINING; NICKEL COMPOUNDS; RAPID PROTOTYPING;

ELECTROCHEMICAL DEPOSITION; MICROENGINEERING; MICROFABRICATION;

MICROELECTROMECHANICAL DEVICES;

EID: 0034542039     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.396421     Document Type: Article

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