Calibration requirements for identifying and sizing wafer defects by scanner measurements

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4099, Issue 1, 2000, Pages 42-47

  Stover, John C ^a   Scheer, Craig A ^a  

^a ADE Corporation   (United States)

Author keywords

Calibration; Defect identification; Defect sizing; PSL standards; Wafer defects; Wafer scanners

Indexed keywords

CALIBRATION; CRYSTAL DEFECTS; PITTING; SCANNING;

WAFER DEFECT SIZING;

SILICON WAFERS;

EID: 0034541799     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.405832     Document Type: Article

References (0)