Aerosol formation in the cyclohexene-ozone system

Environmental Science and Technology

Volumn 34, Issue 23, 2000, Pages 4894-4901

  Kalberer, M ^a   Yu, J ^a   Cocker, D R ^a   Flagan, R C ^a   Seinfeld, J H ^a  

^a California Institute of Technology   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ORGANIC ACIDS; OZONE; PARTICLES (PARTICULATE MATTER); PHOTOOXIDATION; VAPOR PRESSURE; VOLATILE ORGANIC COMPOUNDS;

ADIPIC ACID; ATMOSPHERIC OXIDATION; CYCLOHEXENE; HYDROADIPIC ACID; HYDROXYGLUTARIC ACID; SECONDARY ORGANIC AEROSOL;

ATMOSPHERIC AEROSOLS;

ADIPIC ACID; CYCLOHEXANE; GLUTARIC ACID DERIVATIVE; OZONE; PENTANE;

AEROSOL FORMATION; OXIDATION;

AEROSOL; ARTICLE; CHEMICAL COMPOSITION; CHEMICAL REACTION; CHEMICAL STRUCTURE; DERIVATIZATION; GAS; MOLECULAR WEIGHT; PHOTOOXIDATION; VAPOR;

EID: 0034541223     PISSN: 0013936X     EISSN: None     Source Type: Journal    
DOI: 10.1021/es001180f     Document Type: Article

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