New overlay pattern design for real-time focus and tilt monitor

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4182, Issue 1, 2000, Pages 268-275

  Ku, Chin Yu ^a   Lei, Tan Fu ^a   Shieh, Jia Min ^b   Chiou, Tsann Bim ^b   Lin, Hwang Kuen ^c  

^a NATIONAL CHIAO TUNG UNIVERSITY   (Taiwan)

^b NATIONAL NANO DEVICE LABORATORIES   (Taiwan)

^c VANGUARD INTERNATIONAL SEMICONDUCTOR CORPORATION   (Taiwan)

Author keywords

Bar in bar (BIB); Focus, til; Real time process control

Indexed keywords

LITHOGRAPHY; PHASE SHIFT; SILICON WAFERS;

DEPTH OF FOCUS (DOF); NUMERICAL APERTURE; OVERLAY PATTERNS;

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 0034538797     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.410087     Document Type: Article

References (0)