Feasibility and applicability of integrated metrology using spectroscopic ellipsometry in a cluster tool

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4182, Issue 1, 2000, Pages 115-123

  Boher, Pierre ^b   Pickering, Christopher ^a   Tarnowka, Alexandre ^a   Piel, Jean Philippe ^b   Evrard, Patrick ^b   Stehle, Jean Louis ^b  

^a DEFENCE SCIENCE AND TECHNOLOGY LABORATORY   (United Kingdom)

^b SOPRA   (France)

Author keywords

Cluster tool; In situ; Integrated metrology; SiGe; Spectroscopic ellipsometry

Indexed keywords

MULTILAYERS; NONDESTRUCTIVE EXAMINATION; OPTICAL COATINGS; SEMICONDUCTING SILICON COMPOUNDS; THICKNESS MEASUREMENT; THIN FILMS;

INTEGRATED METROLOGY; SPECTROSCOPIC ELLIPSOMETRY;

ELLIPSOMETRY;

EID: 0034538660     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.410067     Document Type: Article

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