High-pressure stability in ordered mesoporous silicas: Rigidity and elasticity through nanometer scale arches

Journal of Physical Chemistry B

Volumn 104, Issue 50, 2000, Pages 11837-11841

  Wu, Junjun ^a   Liu, Xiaoyang ^a   Tolbert, Sarah H ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COMPOSITE MATERIALS; COMPRESSIBILITY; ELASTIC MODULI; ELASTICITY; HIGH PRESSURE EFFECTS; NANOSTRUCTURED MATERIALS; NUCLEAR MAGNETIC RESONANCE SPECTROSCOPY; RIGIDITY; SILICA; STRUCTURE (COMPOSITION); SURFACE ACTIVE AGENTS; X RAY DIFFRACTION ANALYSIS;

ATOMIC SCALE BONDING; MESOPOROUS SILICAS; NANOMETERSCALE ORDER; POSTSYNTHETIC TREATMENTS; SURFACTANT TEMPLATED SILICAS;

MESOPOROUS MATERIALS;

EID: 0034516186     PISSN: 15206106     EISSN: None     Source Type: Journal    
DOI: 10.1021/jp002938k     Document Type: Article

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