Electrical resistance of Ti-B-Al-O thin films deposited by r.f. magnetron sputtering

Thin Solid Films

Volumn 377-378, Issue , 2000, Pages 772-775

  Kim, S K ^a   Ahn, Y H ^a  

^a University of Ulsan   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC CONDUCTIVITY OF SOLIDS; ELECTRIC RESISTANCE MEASUREMENT; HIGH TEMPERATURE OPERATIONS; MAGNETRON SPUTTERING; SPUTTER DEPOSITION; THIN FILMS; TITANIUM COMPOUNDS;

TITANIUM BARIUM ALUMINA;

CONDUCTIVE FILMS;

EID: 0034515081     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(00)01286-4     Document Type: Article

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