Effect of the hybrid etching methods on the field emission characteristics of Mo-tip field emitter arrays

Journal of the Electrochemical Society

Volumn 147, Issue 12, 2000, Pages 4705-4708

  Kim, Hoon ^a   Ju, Byeong Kwon ^a   Lee, Yun Hi ^a   Jang, Jin ^b   Oh, Myung Hwan ^a  

^a Korea Institute of Science and Technology   (South Korea)

^b Kyung Hee University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; DOPING (ADDITIVES); DRY ETCHING; ELECTRON EMISSION; FINITE ELEMENT METHOD; MOLYBDENUM; SILICON WAFERS;

FIELD EMITTER ARRAYS (FEA);

FIELD EMISSION CATHODES;

EID: 0034514427     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1394127     Document Type: Article

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