Hydrogen-plasma-enhanced oxygen precipitation in silicon

Journal of Physics Condensed Matter

Volumn 12, Issue 49, 2000, Pages 10145-10152

  Markevich, V P ^a   Murin, L I ^b   Lindstrom J L ^c   Ulyashin, A G ^d   Job, R ^d   Fahrner, W R ^d   Raiko, V ^e  

^a UNIVERSITY OF MANCHESTER   (United Kingdom)

^b INSTITUTE OF SOLID STATE AND SEMICONDUCTOR PHYSICS   (Belarus)

^c LUND UNIVERSITY   (Sweden)

^d UNIVERSITY OF HAGEN   (Germany)

^e UNIVERSITY OF WUPPERTAL   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL GROWTH FROM MELT; HYDROGEN; LIGHT ABSORPTION; NITROGEN; OXYGEN; PLASMA APPLICATIONS;

PLASMA TREATMENT;

SEMICONDUCTING SILICON;

EID: 0034513496     PISSN: 09538984     EISSN: None     Source Type: Journal    
DOI: 10.1088/0953-8984/12/49/313     Document Type: Article

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