Capillary discharge plasmas as a source of EUV and soft X-ray radiation

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4144, Issue 1, 2000, Pages 68-75

  Shevelko, Alexander P ^a   Knight, Larry V ^b   Yakushev, Oleg F ^a  

^a LEBEDEV PHYSICAL INSTITUTE   (Russian Federation)

^b Brigham Young University   (United States)

Author keywords

Capillary discharge plasma; EUV lithography; EUV source; Soft x ray microscopy

Indexed keywords

CAPACITORS; ELECTRONS; IONS; PLASMA APPLICATIONS; REFLECTOMETERS; SPECTROGRAPHS; ULTRAVIOLET RADIATION; X RAY LITHOGRAPHY; X RAY MICROSCOPES;

EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY; LOW-INDUCTANCE CAPACITORS;

X RAY RADIOGRAPHY;

EID: 0034510235     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.405905     Document Type: Article

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