RIE lag in diffractive optical element etching

Microelectronic Engineering

Volumn 54, Issue 3-4, 2000, Pages 315-322

  Ting, Jyh Hua ^a   Su, Jung Chieh ^b   Su, Shyang ^a,c  

^a NATIONAL NANO DEVICE LABORATORIES   (Taiwan)

^b INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE   (Taiwan)

^c NATIONAL CHIAO TUNG UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

ANISOTROPY; ASPECT RATIO; COMPOSITION EFFECTS; DIFFRACTIVE OPTICS; MASKS; OXYGEN; REACTIVE ION ETCHING; SILICA;

DIFFRACTIVE OPTICAL ELEMENTS;

OPTICAL DEVICES;

EID: 0034508920     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(99)00450-5     Document Type: Article

References (7)

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