Direct experimental determination and modeling of VUV induced bulk conduction in dielectrics during plasma processing

International Symposium on Plasma Process-Induced Damage, P2ID, Proceedings

Volumn , Issue , 2000, Pages 157-160

  Joshi, Mayur ^a   McVittie, James P ^a   Saraswat, Krishna ^a  

^a STANFORD UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; CURRENT DENSITY; DIELECTRIC MATERIALS; ELECTRIC FIELD EFFECTS; ENERGY GAP; PHOTOCONDUCTIVITY; PHOTOCURRENTS; PHOTONS; SILICON NITRIDE; ULTRAVIOLET RADIATION;

CHEMICAL VAPOR DEPOSITION SILICON NITRIDE; PLASMA PROCESSING; VACUUM ULTRAVIOLET PHOTONS;

PLASMA APPLICATIONS;

EID: 0034507868     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Article

References (3)