Atomic-scale control of oxide substrate surface/termination and novel heteroepitaxial growth

Materials Research Society Symposium - Proceedings

Volumn 587, Issue , 2000, Pages

  Yoshimoto, Mamoru ^a   Mizuno, Keisuke ^a   Miyahara, Takafumi ^a  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; EPITAXIAL GROWTH; REFLECTION HIGH ENERGY ELECTRON DIFFRACTION; SINGLE CRYSTALS; SUBSTRATES; SURFACE STRUCTURE;

SINGLE CRYSTAL OXIDE SUBSTRATES;

OXIDES;

EID: 0034506008     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (20)