Nanoscale control of layer thickness for EL devices by mass-controlled layer-by-layer sequential adsorption process

Materials Research Society Symposium - Proceedings

Volumn 598, Issue , 2000, Pages

  Shiratori, Seimei ^a   Yamada, Masayoshi ^a   Ito, Takahiro ^a   Wang, Tom C ^b   Rubner, Michael F ^b  

^a KEIO UNIVERSITY   (Japan)

^b MASSACHUSETTS INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ADSORPTION; FILM PREPARATION; LUMINESCENT DEVICES; MONOMERS; RUTHENIUM COMPOUNDS; SURFACE ACTIVE AGENTS; THICKNESS CONTROL; ULTRATHIN FILMS;

MASS-CONTROLLED SEQUENTIAL ADSORPTION PROCESS; RUTHENIUM HEXAFLUOROPHOSPHATE;

POLYELECTROLYTES;

EID: 0034504743     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (9)

1. Decher. G, Hong. J.D. And J. Schmit, Thin Solid Films,210/211,831(1992).
2. Dongsik Yoo, Seimei S. Shiratori, and Michael F. Rubner, Macromolecules 31, 4309-4318, 1998.
3. A.C. Fou, O. Onitsuka, M. Ferreira, and M.F. Rubner, J.Appl.Phys. 79. (10). 15 May. 1996.
4. Masayoshi Yamada and Seimei Sha Shiratori, The 10th International Conference on Solid-State Sensors and Actuators, Transducer 99, Digest of technical papers. p.1880-1881, June.1999. Accepted for publication in Sensors & Actuators 2000.
5. th International Symposium on Polymers for Advanced Technologies, PAT-99-Tokyo,Abstracts p.253, August 31-September. 5,1999.
6. Aiping Wu, Jinkyu Lee, Michael F. Rubner, Thin Solid Films. 327 (1998) 663.
7. th International Symposium on Polymers for Advanced Technologies, PAT-99 Tokyo, Abstracts p.286, August 31 Sept.5,1999. Accepted in Advanced Polymer Technology (1999).
8. Seimei S. Shiratori, "Evaluation of EL Devices Using Ruthenium (II) Complex", International Conference on Sceince and technologies of advanced polymers, ICAP-99, p.116-117.1999.
9. Seimei Shiratori, PCT/JP99/04432.