Stranski-Krastanov growth of Si on SiC(0001)

Thin Solid Films

Volumn 380, Issue 1-2, 2000, Pages 42-45

  Fissel, A ^a   Akhtariev, R ^a   Richter, W ^a  

^a FRIEDRICH SCHILLER UNIVERSITY JENA   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

FILM GROWTH; MOLECULAR BEAM EPITAXY; MONOLAYERS; REACTION KINETICS; REFLECTION HIGH ENERGY ELECTRON DIFFRACTION; SEMICONDUCTING SILICON; WETTING;

STRANSKI-KRASTANOV GROWTH;

SEMICONDUCTING FILMS;

EID: 0034504486     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(00)01525-X     Document Type: Article

References (6)

1. Fissel A., Schröter B., Richter W. Appl. Phys. Lett. 66:1995;3182.
2. Fissel A., Kaiser U., Ducke E., Schröter B., Richter W. J. Cryst. Growth. 154:1995;72.
3. Northrup J.E., Neugebauer J. Phys. Rev. B. 52:1995;R17001.
4. Fissel A., Pfennighaus K., Richter W. Appl. Phys. Lett. 71:1997;2981.
5. Fissel A., Pfennighaus K., Richter W. Thin Solid Films. 318:1998;88.
6. G. Heß, A. Bauer, J. Kräußlich, A. Fissel, B. Schröter, R. Sauerbrey, K. Goetz, Thin Solid Films, in press.