Multilayer X-ray optics for energies E>8 keV and their application in X-ray analysis

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4144, Issue 1, 2000, Pages 137-147

  Dietsch, Reiner ^a   Braun, Stefan ^a   Holz, Thomas ^a   Mai, Hermann ^a   Scholz, Roland ^b   Bruegemann, Lutz ^c  

^a FRAUNHOFER INSTITUTE FOR MATERIAL AND BEAM TECHNOLOGY IWS   (Germany)

^b MAX PLANCK INSTITUTE OF MICROSTRUCTURE PHYSICS   (Germany)

^c BRUKER AXS GMBH   (Germany)

Author keywords

G bel Mirror; HREM; Parallel beam X ray optics; PLD (Pulsed Laser Deposition); X ray mirror; XRD (X ray diffraction); XRR (X ray reflectometry)

Indexed keywords

COMPUTER SIMULATION; DIFFRACTOMETERS; ELECTRON ENERGY LEVELS; HIGH RESOLUTION ELECTRON MICROSCOPY; OPTICAL MULTILAYERS; PULSED LASER APPLICATIONS; REFLECTION; REFLECTOMETERS; SUBSTRATES; SURFACE PROPERTIES; X RAY DIFFRACTION ANALYSIS;

PULSED LASER DEPOSITION (PLD); X-RAY OPTICS; X-RAY REFLECTOMETRY (XRR);

X RAYS;

EID: 0034498691     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.405887     Document Type: Article

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