Origin of non-uniformity in MBE grown nanometer-sized InGaAs ridge quantum wires and its removal by atomic hydrogen-assisted cleaning

Thin Solid Films

Volumn 380, Issue 1-2, 2000, Pages 189-191

  Muranaka, Tsutomu ^a   Jiang, Chao ^a   Ito, Akira ^a   Hasegawa, Hideki ^a  

^a HOKKAIDO UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CLEANING; MOLECULAR BEAM EPITAXY; NANOSTRUCTURED MATERIALS; PHOTOLUMINESCENCE; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTING INDIUM GALLIUM ARSENIDE; SEMICONDUCTOR GROWTH; TRANSMISSION ELECTRON MICROSCOPY; X RAY PHOTOELECTRON SPECTROSCOPY;

ATOMIC HYDROGEN CLEANING;

SEMICONDUCTOR QUANTUM WIRES;

EID: 0034498356     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(00)01500-5     Document Type: Article

References (4)

1. Muranaka T., Okada H., Fujikura H., Hasegawa H. Jpn. J. Appl. Phys. 38:1999;1071.
2. Muranaka T., Fujikura H., Hasegawa H. Inst. Phys. Conf. Ser. 166:2000;187.
3. Hollinger G., Blanchet R., Gendry M., Santinelli C., Skheyta R., Viktorovitch P. J. Appl. Phys. 67:1990;4173.
4. Yang B.X., He L., Hasegawa H. J. Electron. Mater. 25:1996;306.