O2-plasma degradation of low-K organic dielectric and its effective solution for damascene trenches

International Symposium on Plasma Process-Induced Damage, P2ID, Proceedings

Volumn , Issue , 2000, Pages 81-84

  Yeh, Ching Fa ^a   Lee, Yueh Chuan ^a   Su, Yuh Ching ^a   Wu, Kwo Hau ^a   Lin, Chein Hsin ^a  

^a NATIONAL CHIAO TUNG UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

DEGRADATION; DEPOSITION; DIELECTRIC MATERIALS; FOURIER TRANSFORM INFRARED SPECTROSCOPY; LEAKAGE CURRENTS; PERMITTIVITY; PLASMA ETCHING; THERMODYNAMIC STABILITY;

ASHING INDUCED DEGRADATION; DAMASCENE TRENCHES; METHYLSILSESQUIOXANE; ORGANIC DIELECTRIC; PLASMA DEGRADATION; SIDEWALL CAPPING TECHNOLOGY;

PLASMA APPLICATIONS;

EID: 0034498004     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Article

References (7)