Developing a manufacturable process for the deposition of thick polysilicon films for micro machined devices

IEEE International Symposium on Semiconductor Manufacturing Conference, Proceedings

Volumn , Issue , 2000, Pages 357-366

  Nunan, Kieran ^a   Ready, Glenn ^a   Garone, Peter ^a   Sturdy, Graham ^a   Sledziewski, John ^a  

^a ANALOG DEVICES INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; DEPOSITION; GRAIN SIZE AND SHAPE; MICROELECTROMECHANICAL DEVICES; MOS DEVICES; PHASE COMPOSITION; POLYSILICON; RESIDUAL STRESSES; TENSILE STRENGTH; THICK FILMS;

HIGH VOLUME PRODUCTIONS; THICK POLYSILICON FILMS;

SEMICONDUCTING FILMS;

EID: 0034484348     PISSN: 10788743     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (5)