Third-order optical nonlinearities of Ge nanocrystals embedded in a silica matrix

Conference Proceedings - Lasers and Electro-Optics Society Annual Meeting-LEOS

Volumn 1, Issue , 2000, Pages 314-315

  Li, H P ^a   Kam, C H ^a   Lam, Y L ^a   Jie, Y X ^b   Wee, A T S ^b   Hua, C H A ^b   Ji, W ^b  

^a NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

^b NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; ARGON; GERMANIUM; HIGH RESOLUTION ELECTRON MICROSCOPY; LASER PULSES; LIGHT ABSORPTION; NANOSTRUCTURED MATERIALS; REFRACTIVE INDEX; SILICA; SPUTTERING;

GERMANIUM NANOCRYSTAL; HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPE IMAGING; NONLINEAR REFRACTION INDEX; THIRD ORDER OPTICAL NONLINEARITY;

NONLINEAR OPTICS;

EID: 0034484172     PISSN: 10928081     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (0)