Tolerance analysis for manufacturing to direct process capability improvement efforts

IEEE International Symposium on Semiconductor Manufacturing Conference, Proceedings

Volumn , Issue , 2000, Pages 377-386

  Hirschman, Karl D ^a  

^a ROCHESTER INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; FITS AND TOLERANCES; PROCESS CONTROL; QUALITY CONTROL; SEMICONDUCTOR DEVICE MODELS; STATISTICAL METHODS;

TAGUCHI METHODS;

CMOS INTEGRATED CIRCUITS;

EID: 0034482809     PISSN: 10788743     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (11)