Refractive index modification due to the Uv-photodecomposition of polysilane and its application as phase mask

Molecular Crystals and Liquid Crystals Science and Technology Section A: Molecular Crystals and Liquid Crystals

Volumn 349, Issue , 2000, Pages 119-122

  Nagayama, Norio ^a   Shimono, Mayuko ^a   Sato, Tetsuo ^a   Yokoyama, Masaaki ^a  

^a OSAKA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ABSORPTION; ELLIPSOMETRY; MERCURY VAPOR LAMPS; PHASE TRANSITIONS; PHOTOLYSIS; PLASTIC FILMS; POLYSILANES; REFRACTIVE INDEX;

OPTICAL CORRELATOR; PHASE MASK; PHOTOREFRACTIVE POLYMER; POLYMETHYLPHENYLSILANE; ULTRAVIOLET PHOTODECOMPOSITION;

PHOTOREFRACTIVE MATERIALS;

EID: 0034479210     PISSN: 1058725X     EISSN: None     Source Type: Journal    
DOI: 10.1080/10587250008024880     Document Type: Article

References (3)

1. B. L. Volodin et al., Nature, 383, 58(1996).
2. M. Yokoyama, Proceeding of Korea-Japan Joint Forum '97 on Organic Materials for Electronics & Photonics, 11(1997).
3. N. Nagayaama et al., Mol. Cryst. Liq. Cryst., in press.